Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

Huang, Jiaxu; Xu, Kang; Hu, Jin; Yuan, Dandan; Li, Jun; Qiao, Jingyu; Xu, Shaolin

2022-07-01

10.1021/acs.nanolett.2c01740

NANO LETTERS   Impact Factor & Quartile

1530-6984

1530-6992

This paper proposes a one-step maskless 2D nanopatterning approach named self-aligned plasmonic lithography (SPL) by line-shaped ultrafast laser ablation under atmospheric conditions for the first time. Through a theoretical calculation of electric field and experimental verification, we proved that homogeneous interference of laser-excited surface plasmon polar-itons (SPPs) can be achieved and used to generate long-range ordered 2D nanostructures in a self-aligned way over a wafer-sized area within several minutes. Moreover, the self-aligned nanostruc-tures can be freely transferred between embossed nanopillars and engraved nanoholes by modulating the excitation intensity of SPPs interference through altering the incident laser energy. The SPL technique exhibits further controllability in the shape, orientation, and period of achievable nanopatterns on a wide range of semiconductors and metals by tuning processing parameters. Nanopatterned films can further act as masks to transfer structures into other bulk materials, as demonstrated in silica.

Self-aligned plasmonic lithography (SPL) laser-induced periodic surface structure (LIPSS) 2D nanostructures SPPs interference long-range ordered nanostructures

SCI ; EI

English

NI Journal Papers

First ; Corresponding

Guangdong Provincial University Science and Technology Prog r a m[2020KTSCX119] ; Shenzhen Science and Technology Programs["20200925155508001","JCYJ20210324115608024","GJHZ20- 190820151801786","KQTD20170810110250357"]

Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics

Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter

WOS:000830523500001

AMER CHEMICAL SOC

20223412593602

Electric fields ; Electromagnetic wave polarization ; Films ; Laser ablation ; Laser excitation ; Nanostructures ; Plasmonics ; Semiconductor lasers ; Surface plasmon resonance ; Surface structure ; Ultrafast lasers

Heat Transfer:641.2 ; Electricity: Basic Concepts and Phenomena:701.1 ; Electromagnetic Waves:711 ; Lasers, General:744.1 ; Semiconductor Lasers:744.4.1 ; Laser Beam Interactions:744.8 ; Laser Applications:744.9 ; Nanotechnology:761 ; Physical Chemistry:801.4 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Plasma Physics:932.3 ; Solid State Physics:933

MATERIALS SCIENCE

Web of Science

Southern Univ Sci & Technol, Dept Mech & Energy Engn, Shenzhen 518055, Peoples R China

Huang, Jiaxu,Xu, Kang,Hu, Jin,et al. Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures[J]. NANO LETTERS,2022,22:6223-6228.

Huang, Jiaxu.,Xu, Kang.,Hu, Jin.,Yuan, Dandan.,Li, Jun.,...&Xu, Shaolin.(2022).Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures.NANO LETTERS,22,6223-6228.

Huang, Jiaxu,et al."Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures".NANO LETTERS 22(2022):6223-6228.