中文版 | English
Title

Ferroelectric Memory Based on Topological Domain Structures: A Phase Field Simulation

Author
Corresponding AuthorLi,Bo
Publication Years
2022-06-01
DOI
Source Title
EISSN
2073-4352
Volume12Issue:6
Abstract
The low storage density of ferroelectric thin film memory currently limits the further application of ferroelectric memory. Topologies based on controllable ferroelectric domain structures offer opportunities to develop microelectronic devices such as high-density memories. This study uses ferroelectric topology domains in a ferroelectric field-effect transistor (FeFET) structure for memory. The electrical behavior of FeFET and its flip properties under strain and electric fields are investigated using a phase-field model combined with the device equations of field-effect transistors. When the dimensionless electric field changes from −0.10 to 0.10, the memory window drops from 2.49 V to 0.6 V and the on-state current drops from 2.511 mA to 1.951 mA; the off-state current grows from 1.532 mA to 1.877 mA. External tensile stress increases the memory window and off-state current, while compressive stress decreases it. This study shows that a ferroelectric topology can be used as memory and could significantly increase the storage density of ferroelectric memory.
Keywords
URL[Source Record]
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Language
English
SUSTech Authorship
Corresponding
Funding Project
China Postdoctoral Science Foundation[2019M663178];
WOS Accession No
WOS:000818250300001
Scopus EID
2-s2.0-85131689023
Data Source
Scopus
Citation statistics
Cited Times [WOS]:1
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/395599
DepartmentDepartment of Materials Science and Engineering
Affiliation
1.School of Materials and Engineering,Xiangtan University,Xiangtan,411105,China
2.Institute of Biomedical & Health Engineering,Shenzhen Institute of Advanced Technology (SIAT),Chinese Academy of Sciences (CAS),Shenzhen,518035,China
3.Department of Materials Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China
Corresponding Author AffilicationDepartment of Materials Science and Engineering
Recommended Citation
GB/T 7714
Huang,Jing,Tan,Pengfei,Wang,Fang,et al. Ferroelectric Memory Based on Topological Domain Structures: A Phase Field Simulation[J]. Crystals,2022,12(6).
APA
Huang,Jing,Tan,Pengfei,Wang,Fang,&Li,Bo.(2022).Ferroelectric Memory Based on Topological Domain Structures: A Phase Field Simulation.Crystals,12(6).
MLA
Huang,Jing,et al."Ferroelectric Memory Based on Topological Domain Structures: A Phase Field Simulation".Crystals 12.6(2022).
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