Title | Full Color Quantum Dot Light-Emitting Diodes Patterned by Photolithography Technology |
Author | |
Corresponding Author | Chen,Shuming |
DOI | |
Publication Years | 2018
|
ISSN | 0097-966X
|
EISSN | 2168-0159
|
Source Title | |
Volume | 49
|
Issue | 1
|
Pages | 973-976
|
Abstract | Photolithography is a high resolution and mature patterning technique which has been widely used in semiconductor industry. For display application, a pixel consists of red (R), green (G) and blue (B) side-by-side sub-pixels, which thereby requires a high resolution patterning of the light-emission layers. In this work, photolithography is used to fine pattern the quantum dot (QD) light-emitting layers. To prevent the QDs being washed off during the lift-off process, the ZnMgO layer is treated by the hydrophobic material hexamethyldisilazane (HMDS). With HMDS treatment, the adhesion between the QDs and the ZnMgO is effectively improved. As a result, side-by-side RGB QD with pixel size 30 μm × 120 μm is successfully achieved. After patterning, the R, G and B QLEDs exhibit a maximum current efficiency of 11.6 cd/A, 29.7 cd/A and 1.5 cd/A, respectively. |
Keywords | |
SUSTech Authorship | First
; Corresponding
|
Language | English
|
URL | [Source Record] |
Scopus EID | 2-s2.0-85072110776
|
Data Source | Scopus
|
Citation statistics |
Cited Times [WOS]:0
|
Document Type | Conference paper |
Identifier | http://kc.sustech.edu.cn/handle/2SGJ60CL/402806 |
Department | Department of Electrical and Electronic Engineering |
Affiliation | Department of Electrical and Electronic Engineering,Southern University of Science and Technology,Shenzhen,518055,China |
First Author Affilication | Department of Electrical and Electronic Engineering |
Corresponding Author Affilication | Department of Electrical and Electronic Engineering |
First Author's First Affilication | Department of Electrical and Electronic Engineering |
Recommended Citation GB/T 7714 |
Ji,Tingjing,Jin,Shuang,Chen,Bingwei,et al. Full Color Quantum Dot Light-Emitting Diodes Patterned by Photolithography Technology[C],2018:973-976.
|
Files in This Item: | There are no files associated with this item. |
|
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment