中文版 | English
Title

Full Color Quantum Dot Light-Emitting Diodes Patterned by Photolithography Technology

Author
Corresponding AuthorChen,Shuming
DOI
Publication Years
2018
ISSN
0097-966X
EISSN
2168-0159
Source Title
Volume
49
Issue
1
Pages
973-976
Abstract
Photolithography is a high resolution and mature patterning technique which has been widely used in semiconductor industry. For display application, a pixel consists of red (R), green (G) and blue (B) side-by-side sub-pixels, which thereby requires a high resolution patterning of the light-emission layers. In this work, photolithography is used to fine pattern the quantum dot (QD) light-emitting layers. To prevent the QDs being washed off during the lift-off process, the ZnMgO layer is treated by the hydrophobic material hexamethyldisilazane (HMDS). With HMDS treatment, the adhesion between the QDs and the ZnMgO is effectively improved. As a result, side-by-side RGB QD with pixel size 30 μm × 120 μm is successfully achieved. After patterning, the R, G and B QLEDs exhibit a maximum current efficiency of 11.6 cd/A, 29.7 cd/A and 1.5 cd/A, respectively.
Keywords
SUSTech Authorship
First ; Corresponding
Language
English
URL[Source Record]
Scopus EID
2-s2.0-85072110776
Data Source
Scopus
Citation statistics
Cited Times [WOS]:0
Document TypeConference paper
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/402806
DepartmentDepartment of Electrical and Electronic Engineering
Affiliation
Department of Electrical and Electronic Engineering,Southern University of Science and Technology,Shenzhen,518055,China
First Author AffilicationDepartment of Electrical and Electronic Engineering
Corresponding Author AffilicationDepartment of Electrical and Electronic Engineering
First Author's First AffilicationDepartment of Electrical and Electronic Engineering
Recommended Citation
GB/T 7714
Ji,Tingjing,Jin,Shuang,Chen,Bingwei,et al. Full Color Quantum Dot Light-Emitting Diodes Patterned by Photolithography Technology[C],2018:973-976.
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