Title | Enhanced Performance of P-GaN Gate AlGaN/GaN High-Electron-Mobility Transistors for Power Applications |
Alternative Title | 功率器件 P-GaN 栅极 AlGaN/GaN 高电子迁移率晶体管的研究与性能提升
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Author | |
School number | 11761002
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Degree | 博士
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Discipline | 材料科学与工程
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Supervisor | |
Tutor of External Organizations | Guangrui Xia
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Publication Years | 2021-10-12
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Submission date | 2022-10-20
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University | 英属格伦比亚大学
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Place of Publication | 加拿大
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Abstract | For decades, silicon (Si)-based transistors have been extremely successful in power applications that help to convert, manage, and control electric power. However, their performances are now close to their theoretical limits determined by the fundamental material properties of Si. GaN power transistors can provide better power efficiencies, faster speeds, and lower system costs. The leading GaN-based power transistors are p-GaN gate AlGaN/GaN high-electron-mobility transistors (HEMTs), though there are still room to improve their performances and reliabilities. This work presents a comprehensive study of p-GaN gate HEMTs. It demonstrated a new failure mechanism analysis method and three different methods to enhance the devices’ performances. |
Keywords | |
Language | English
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Training classes | 联合培养
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Document Type | Thesis |
Identifier | http://kc.sustech.edu.cn/handle/2SGJ60CL/406315 |
Department | SUSTech Institute of Microelectronics |
Recommended Citation GB/T 7714 |
Zhou GN. Enhanced Performance of P-GaN Gate AlGaN/GaN High-Electron-Mobility Transistors for Power Applications[D]. 加拿大. 英属格伦比亚大学,2021.
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