Title | Superior wear resistance in a TaMoNb compositionally complex alloy film via in-situ formation of the amorphous-crystalline nanocomposite layer and gradient nanostructure |
Author | |
Publication Years | 2023-01-15
|
DOI | |
Source Title | |
ISSN | 1359-6454
|
EISSN | 1873-2453
|
Volume | 243 |
Abstract | Metallic alloys with exceptional wear resistance have long been an attractive prospect for their enhanced safety, reliability, and service duration. Herein, we propose a strategy to achieve superior wear resistance via the in-situ formation of an amorphous-crystalline nanocomposite layer and gradient nanostructure during wear at elevated temperatures. This strategy was demonstrated in a compositionally complex alloy TaMoNb film with a columnar grain structure upon sliding wear at 300 °C. In contrast to the surface layer formed at room temperature (RT), which consists of irregularly shaped TaMoNb nanograins with non-uniform size and distribution in the amorphous oxide matrix, a dense 300 nm-thick nanocomposite layer comprising equiaxed nanograins of only ∼6 nm embedded in the amorphous oxide matrix is formed during wear at 300 °C, below which is a 600 nm-thick plastic-deformation region that exhibits gradient nanostructure. The microstructure induced by wear at 400 °C shows the presence of a 30 nm-thick amorphous layer below the nanocomposite surface layer but no appreciable plastic deformation in the base film. Consequently, the TaMoNb film exhibits a remarkably low wear rate upon wear at 300 °C that is less than 25% of those at RT and 400 °C. Such superior wear resistance is attributed to the specific wear-induced microstructure generated at 300 °C, which has high strength and large homogeneous deformation. Thus, this work offers a new strategy for designing self-adaptive wear-resistant alloys for application in extreme thermo-mechanical service environments. |
Keywords | |
URL | [Source Record] |
Indexed By | |
Language | English
|
SUSTech Authorship | First
|
Funding Project | Basic and Applied Basic Research Foundation of Guangdong Province[2022A1515011322];National Natural Science Foundation of China[52122102];Shenzhen Fundamental Research Program[JCYJ20190809115211227];
|
WOS Research Area | Materials Science
; Metallurgy & Metallurgical Engineering
|
WOS Subject | Materials Science, Multidisciplinary
; Metallurgy & Metallurgical Engineering
|
WOS Accession No | WOS:000900016800001
|
Publisher | |
ESI Research Field | MATERIALS SCIENCE
|
Scopus EID | 2-s2.0-85142180554
|
Data Source | Scopus
|
Citation statistics |
Cited Times [WOS]:9
|
Document Type | Journal Article |
Identifier | http://kc.sustech.edu.cn/handle/2SGJ60CL/412537 |
Department | Department of Materials Science and Engineering |
Affiliation | 1.Department of Materials Science and Engineering,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China 2.Department of Industrial and Systems Engineering,Research Institute for Advanced Manufacturing,the Hong Kong Polytechnic University,Kowloon,Hung Hom,Hong Kong |
First Author Affilication | Department of Materials Science and Engineering |
First Author's First Affilication | Department of Materials Science and Engineering |
Recommended Citation GB/T 7714 |
Luo,Jiasi,Sun,Wanting,Liang,Dingshan,et al. Superior wear resistance in a TaMoNb compositionally complex alloy film via in-situ formation of the amorphous-crystalline nanocomposite layer and gradient nanostructure[J]. ACTA MATERIALIA,2023,243.
|
APA |
Luo,Jiasi,Sun,Wanting,Liang,Dingshan,Chan,K. C.,Yang,Xu Sheng,&Ren,Fuzeng.(2023).Superior wear resistance in a TaMoNb compositionally complex alloy film via in-situ formation of the amorphous-crystalline nanocomposite layer and gradient nanostructure.ACTA MATERIALIA,243.
|
MLA |
Luo,Jiasi,et al."Superior wear resistance in a TaMoNb compositionally complex alloy film via in-situ formation of the amorphous-crystalline nanocomposite layer and gradient nanostructure".ACTA MATERIALIA 243(2023).
|
Files in This Item: | There are no files associated with this item. |
|
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment