中文版 | English
Title

Hf1-xZrxO2 RRAM Prepared via Co-Sputtering with High Uniformity, Fast Switching Time of 10 ns, and Low Switching Energy of 20 pJ

Author
Corresponding AuthorMei Shen; Yida Li
Publication Years
2022-09
Conference Name
2022 International Conference on Solid State Devices and Materials (SSDM)
Conference Date
2022-09-27
Conference Place
日本
SUSTech Authorship
First ; Corresponding
Data Source
人工提交
Document TypeConference paper
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/415850
DepartmentSouthern University of Science and Technology
工学院_深港微电子学院
Affiliation
1.Southern University of Science and Technology, Shenzhen 518055, China
2.School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai, China 200240
3.Shenzhen Longsys Electronics Co., Ltd, Shenzhen 518000, China
First Author AffilicationSouthern University of Science and Technology
Corresponding Author AffilicationSouthern University of Science and Technology
First Author's First AffilicationSouthern University of Science and Technology
Recommended Citation
GB/T 7714
Quanzhou Zhu,Jun Lan,Bing Zhou,et al. Hf1-xZrxO2 RRAM Prepared via Co-Sputtering with High Uniformity, Fast Switching Time of 10 ns, and Low Switching Energy of 20 pJ[C],2022.
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File Name/Size DocType Version Access License
3_文章.pdf(601KB) Restricted Access--
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