中文版 | English
Title

Modified Spatially Confined Strategy Enabled Mild Growth Kinetics for Facile Growth Management of Atomically-Thin Tungsten Disulfides

Author
Corresponding AuthorCheng,Chun
Publication Years
2022
DOI
Source Title
EISSN
2198-3844
Abstract
Chemical vapor deposition (CVD) has been widely used to produce high quality 2D transitional metal dichalcogenides (2D TMDCs). However, violent evaporation and large diffusivity discrepancy of metal and chalcogen precursors at elevated temperatures often result in poor regulation on X:M molar ratio (M = Mo, W etc.; X = S, Se, and Te), and thus it is rather challenging to achieve the desired products of 2D TMDCs. Here, a modified spatially confined strategy (MSCS) is utilized to suppress the rising S vapor concentration between two aspectant substrates, upon which the lateral/vertical growth of 2D WS can be selectively regulated via proper S:W zones correspond to greatly broadened time/growth windows. An S:W-time (SW-T) growth diagram was thus proposed as a mapping guide for the general understanding of CVD growth of 2D WS and the design of growth routes for the desired 2D WS. Consequently, a comprehensive growth management of atomically thin WS is achieved, including the versatile controls of domain size, layer number, and lateral/vertical heterostructures (MoS-WS). The lateral heterostructures show an enhanced hydrogen evolution reaction performance. This study advances the substantial understanding to the growth kinetics and provides an effective MSCS protocol for growth design and management of 2D TMDCs.
Keywords
URL[Source Record]
Indexed By
Language
English
SUSTech Authorship
First ; Corresponding
Funding Project
National Natural Science Foundation of China[91963129] ; Guangdong Provincial Key Laboratory of Energy Materials for Electric Power[2018B030322001] ; Basic Research Project of Science and Technology Plan of Shenzhen[JCYJ20180504165655180] ; special Funds for the Cultivation of Guangdong College Students' Scientific and Technological Innovation["pdjh2022c0003","pdjh2022c0005"] ; Southern University of Science and Technology (SUSTech)["2022G01","2022G02"]
WOS Research Area
Chemistry ; Science & Technology - Other Topics ; Materials Science
WOS Subject
Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
WOS Accession No
WOS:000891953800001
Publisher
Scopus EID
2-s2.0-85142933754
Data Source
Scopus
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/416564
DepartmentDepartment of Materials Science and Engineering
Affiliation
1.Department of Materials Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China
2.Department of Physics and Center for Quantum Materials,Hong Kong University of Science and Technology,Hong Kong
3.Center for Infrastructure Engineering,Western Sydney University,Kingswood,2751,Australia
4.Guangdong Provincial Key Laboratory of Energy Materials for Electric Power,Southern University of Science and Technology,Shenzhen,518055,China
First Author AffilicationDepartment of Materials Science and Engineering
Corresponding Author AffilicationDepartment of Materials Science and Engineering;  Southern University of Science and Technology
First Author's First AffilicationDepartment of Materials Science and Engineering
Recommended Citation
GB/T 7714
Wang,Qun,Wang,Shi,Li,Jingyi,et al. Modified Spatially Confined Strategy Enabled Mild Growth Kinetics for Facile Growth Management of Atomically-Thin Tungsten Disulfides[J]. Advanced Science,2022.
APA
Wang,Qun.,Wang,Shi.,Li,Jingyi.,Gan,Yichen.,Jin,Mengtian.,...&Cheng,Chun.(2022).Modified Spatially Confined Strategy Enabled Mild Growth Kinetics for Facile Growth Management of Atomically-Thin Tungsten Disulfides.Advanced Science.
MLA
Wang,Qun,et al."Modified Spatially Confined Strategy Enabled Mild Growth Kinetics for Facile Growth Management of Atomically-Thin Tungsten Disulfides".Advanced Science (2022).
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