中文版 | English
Title

A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device

Author
Corresponding AuthorZhu, Yuan; Su, Longxing
Joint first authorChen, Xiaozhang; Lv, You; Tian, Zhaobo
Publication Years
2023-01-05
DOI
Source Title
ISSN
2050-7526
EISSN
2050-7534
Volume11Issue:2
Abstract

In this study, we developed an artificial synaptic device based on the HfO2 nanocrystals synthesized using a simple hydrothermal method. The metal-insulator-metal (MIM) structure device is designed and fabricated by combining a ceramic-like preparation technique and a standard electrode preparation method. The MIM device shows robust bipolar resistance switching characteristics with high endurance and long retention. High concentration hafnium vacancies are determined, and the formation/rupture of the conductive filament model is proposed to be responsible for the switching behavior between a high resistance state (HRS) and a low resistance state (LRS). In addition, the artificial synaptic device is simulated by applying an external pulse signal with different repetition rates and pulse widths, which exhibits synaptic functions of short term plasticity and long term plasticity. This study demonstrates that HfO2 with abundant hafnium vacancies is a potential prototype material that can be fabricated as an artificial synaptic device for mimicking the synapse of the human brain.

URL[Source Record]
Indexed By
Language
English
SUSTech Authorship
First ; Corresponding
Funding Project
National Natural Science Foundation of China[
WOS Research Area
Materials Science ; Physics
WOS Subject
Materials Science, Multidisciplinary ; Physics, Applied
WOS Accession No
WOS:000899693000001
Publisher
Data Source
Web of Science
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/424056
DepartmentSUSTech Institute of Microelectronics
Affiliation
1.Southern Univ Sci & Technol, Sch Microelect, Shenzhen 518055, Peoples R China
2.Southern Univ Sci & Technol, Engn Res Ctr Integrated Circuits Next Generat Comm, Minist Educ, Shenzhen 518055, Peoples R China
First Author AffilicationSUSTech Institute of Microelectronics
Corresponding Author AffilicationSUSTech Institute of Microelectronics;  Southern University of Science and Technology
First Author's First AffilicationSUSTech Institute of Microelectronics
Recommended Citation
GB/T 7714
Chen, Xiaozhang,Lv, You,Tian, Zhaobo,et al. A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device[J]. Journal of Materials Chemistry C,2023,11(2).
APA
Chen, Xiaozhang,Lv, You,Tian, Zhaobo,Yang, Jingxi,Zhu, Yuan,&Su, Longxing.(2023).A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device.Journal of Materials Chemistry C,11(2).
MLA
Chen, Xiaozhang,et al."A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device".Journal of Materials Chemistry C 11.2(2023).
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