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Title

Voltage Reference With Corner-Aware Replica Selection/Merging for 1.4-mV Accuracy in Harvested Systems Down to 3.9 pW, 0.2 V

Author
Publication Years
2023
DOI
Source Title
ISSN
2169-3536
Volume11Pages:3584-3596
Abstract
This paper introduces a voltage reference design able to operate over the wide supply voltage range from 1.8 V down to 0.2 V, and pW power. To mitigate the effect of global variations (e.g., die-to-die, wafer-to-wafer), the proposed NMOS-only architecture introduces process sensor-driven selection/merging of circuit replicas at boot (or run) time. Being the circuit replicas optimized for different process corners, their selection or merging fundamentally relaxes the traditionally conflicting design tradeoffs that affect the overall voltage accuracy in deep sub-threshold, while not requiring any testing-time trimming or non-volatile memory process option for low-cost applications. Measurements of a 180-nm test chip across 45 dice from different corner wafers demonstrate reliable operation down to 0.2 V with 3.9-pW power consumption at room temperature. The proposed process sensor-driven replica selection is shown to enable 1.6% V-REF process sensitivity (i.e., sigma\mu) , 34.9-mu V\degrees C) mean temperature coefficient, and 60.7- mu\V/V (0.14-%/V) mean line sensitivity across process corners. The resulting 1.4-mV overall absolute accuracy of the reference voltage across dice and corner wafers (1- sigma), voltage fluctuations (0.3 V) and temperature deviation (20 degrees C) is improved by 1.9x compared to the case without replica selection, and by 3- 15.4x compared to prior references with sub-nW consumption.
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URL[Source Record]
Indexed By
Language
English
SUSTech Authorship
Others
Funding Project
Singapore Ministry of Education[MOE2019-T2-2 189]
WOS Research Area
Computer Science ; Engineering ; Telecommunications
WOS Subject
Computer Science, Information Systems ; Engineering, Electrical & Electronic ; Telecommunications
WOS Accession No
WOS:000926563900001
Publisher
Data Source
IEEE
PDF urlhttps://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10007824
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/424571
DepartmentSUSTech Institute of Microelectronics
Affiliation
1.Department of Electrical and Computer Engineering (ECE), National University of Singapore, Queenstown, Singapore
2.School of Microelectronics, Southern University of Science and Technology, Shenzhen, China
3.Department of Computer Engineering, Modeling, Electronics and Systems Engineering, University of Calabria, Rende, Italy
Recommended Citation
GB/T 7714
Luigi Fassio,Longyang Lin,Raffaele De Rose,et al. Voltage Reference With Corner-Aware Replica Selection/Merging for 1.4-mV Accuracy in Harvested Systems Down to 3.9 pW, 0.2 V[J]. IEEE Access,2023,11:3584-3596.
APA
Luigi Fassio,Longyang Lin,Raffaele De Rose,Marco Lanuzza,Felice Crupi,&Massimo Alioto.(2023).Voltage Reference With Corner-Aware Replica Selection/Merging for 1.4-mV Accuracy in Harvested Systems Down to 3.9 pW, 0.2 V.IEEE Access,11,3584-3596.
MLA
Luigi Fassio,et al."Voltage Reference With Corner-Aware Replica Selection/Merging for 1.4-mV Accuracy in Harvested Systems Down to 3.9 pW, 0.2 V".IEEE Access 11(2023):3584-3596.
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