中文版 | English
Title

Interfacial contact barrier and charge carrier transport of MoS2/metal(001) heterostructures

Author
Corresponding AuthorZhao, Yu-Qing; Jiang, Shaolong
Publication Years
2023-03-01
DOI
Source Title
ISSN
1463-9076
EISSN
1463-9084
Abstract
The rapid rise of two-dimensional (2D) materials has aroused increasing interest in the fields of microelectronics and optoelectronics; various types of 2D van der Waals heterostructures (vdWHs), especially those based on MoS2, have been widely investigated in theory and experiment. However, the interfacial properties of MoS2 and the uncommon crystal surface of traditional three-dimensional (3D) metals are yet to be explored. In this paper, we studied heterostructures composed of MoS2 and metal(001) slabs, based on the first-principles calculations, and we uncovered that MoS2/Au(001) and MoS2/Ag(001) vdWHs reveal Schottky contacts, and MoS2/Cu(001) belongs to Ohmic contact and possesses ultrahigh electron tunneling probability at the equilibrium distance. Thus, the MoS2/Cu(001) heterostructure exhibits the best contact performance. Further investigations demonstrate that external longitudinal strain can modulate interfacial contact to engineer the Schottky-Ohmic contact transition and regulate interfacial charge transport. We believe that it is a general strategy to exploit longitudinal strain to improve interfacial contact performance to design and fabricate a multifunctional MoS2-based electronic device.
URL[Source Record]
Indexed By
Language
English
SUSTech Authorship
Corresponding
Funding Project
Postgraduate Research Opportunities Program of HZWTECH (HZWTECH-PROP), Initial Scientific Research Fund of Hunan University of Science and Technology[E51996] ; Scientific Research Fund of Hunan Provincial Education Department, China[20B219] ; Hunan Provincial Natural Science Foundation of China[2020JJ5154] ; National Natural Science Foundation of China[12204166]
WOS Research Area
Chemistry ; Physics
WOS Subject
Chemistry, Physical ; Physics, Atomic, Molecular & Chemical
WOS Accession No
WOS:000953424000001
Publisher
ESI Research Field
CHEMISTRY
Data Source
Web of Science
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/523957
DepartmentDepartment of Physics
Affiliation
1.Hunan Univ Sci & Technol, Sch Phys & Elect Sci, Xiangtan 411201, Peoples R China
2.Hunan Prov Key Lab Intelligent Sensors & New Senso, Xiangtan 411201, Hunan, Peoples R China
3.Hongzhiwei Technol Shanghai Co Ltd, 1599 Xinjinqiao Rd, Shanghai, Peoples R China
4.Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
Corresponding Author AffilicationDepartment of Physics
Recommended Citation
GB/T 7714
Zhang, Zi-Wen,Liu, Zhao-Sheng,Zhang, Jun-Jie,et al. Interfacial contact barrier and charge carrier transport of MoS2/metal(001) heterostructures[J]. PHYSICAL CHEMISTRY CHEMICAL PHYSICS,2023.
APA
Zhang, Zi-Wen.,Liu, Zhao-Sheng.,Zhang, Jun-Jie.,Sun, Bing-Ning.,Zou, Dai-Feng.,...&Jiang, Shaolong.(2023).Interfacial contact barrier and charge carrier transport of MoS2/metal(001) heterostructures.PHYSICAL CHEMISTRY CHEMICAL PHYSICS.
MLA
Zhang, Zi-Wen,et al."Interfacial contact barrier and charge carrier transport of MoS2/metal(001) heterostructures".PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2023).
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