Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors

Zhao，Xin Hua1,2; Zhuang，Jiaqing1; Sun，Qi Jun1; Tang，Zhenhua1; Tang，Xin Gui1; Roy，Vellaisamy A.L.3

2023-08-15

10.1016/j.jallcom.2023.170062

Journal of Alloys and Compounds   Impact Factor & Quartile

0925-8388

1873-4669

Low-power metal oxide transistors are highly required in displays, logic circuit and sensors. High quality gate dielectrics with the properties of high dielectric constant, smooth surface, and excellent insulating performance are critical to realize the above mentioned transistors. In this work, we present a universal strategy by using rare-earth (RE) elements (Y, Er and Yb) as dopants to improve the dielectric properties of zirconia film for low-power transistors. Additionally, all the dielectric films are prepared by solution process, which is compatible with low-cost and large-area manufacturing technology. The leakage current densities of zirconia films decrease from 1.27 × 10 A/cm to 2.8 × 10 A/cm, 6.6 × 10 − 7 A/cm, and 4.3 × 10 A/cm by doping a small amount of Y, Er, and Yb in zirconia films, respectively. Furthermore, bottom-gate top-contact indium-gallium-zinc oxide (IGZO) transistors with RE-doped zirconia dielectrics show one order improved current on/off (∼10) ratio and achieve one order improvement in mobility (3.11, 2.85, 2.75 cmVS for Y-, Er-, Yb-doped devices respectively) compared with that of pure zirconia film based devices (0.30 cmVS). Moreover, the subthreshold swing (SS) of TFTs based on RE-doped and undoped ZrO dielectric films are calculated (0.2, 0.36, 0.21 V/dec for Y-, Er-, Yb-doped devices respectively, and 0.51 V/dec for undoped devices) This study demonstrates the validity of RE ions as dopants in gate dielectrics to achieve high-performance low-power metal oxide transistors.

IGZO Low-power Rare-earth Solution process ZrO2

SCI

English

Others

Basic and Applied Basic Research Foundation of Guangdong Province[2021A1515110719];

Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering

Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering

WOS:000983999500001

ELSEVIER SCIENCE SA

MATERIALS SCIENCE

2-s2.0-85152246990

Scopus

1.School of Physics and Optoelectric Engineering,Guangdong University of Technology,Guangzhou,Guangdong,510006,China
2.Department of Chemistry,Southern University of Science and Technology,Shenzhen,Guangdong,518060,China
3.James Watt School of Engineering,University of Glasgow,Glasgow,G12 8QQ,United Kingdom

Zhao，Xin Hua,Zhuang，Jiaqing,Sun，Qi Jun,et al. Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors[J]. Journal of Alloys and Compounds,2023,952.

Zhao，Xin Hua,Zhuang，Jiaqing,Sun，Qi Jun,Tang，Zhenhua,Tang，Xin Gui,&Roy，Vellaisamy A.L..(2023).Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors.Journal of Alloys and Compounds,952.

Zhao，Xin Hua,et al."Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors".Journal of Alloys and Compounds 952(2023).