中文版 | English
Title

Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors

Author
Publication Years
2023-08-15
DOI
Source Title
ISSN
0925-8388
Volume952
Abstract
Low-power metal oxide transistors are highly required in displays, logic circuit and sensors. High quality gate dielectrics with the properties of high dielectric constant, smooth surface, and excellent insulating performance are critical to realize the above mentioned transistors. In this work, we present a universal strategy by using rare-earth (RE) elements (Y, Er and Yb) as dopants to improve the dielectric properties of zirconia film for low-power transistors. Additionally, all the dielectric films are prepared by solution process, which is compatible with low-cost and large-area manufacturing technology. The leakage current densities of zirconia films decrease from 1.27 × 10 A/cm to 2.8 × 10 A/cm, 6.6 × 10 − 7 A/cm, and 4.3 × 10 A/cm by doping a small amount of Y, Er, and Yb in zirconia films, respectively. Furthermore, bottom-gate top-contact indium-gallium-zinc oxide (IGZO) transistors with RE-doped zirconia dielectrics show one order improved current on/off (∼10) ratio and achieve one order improvement in mobility (3.11, 2.85, 2.75 cmVS for Y-, Er-, Yb-doped devices respectively) compared with that of pure zirconia film based devices (0.30 cmVS). Moreover, the subthreshold swing (SS) of TFTs based on RE-doped and undoped ZrO dielectric films are calculated (0.2, 0.36, 0.21 V/dec for Y-, Er-, Yb-doped devices respectively, and 0.51 V/dec for undoped devices) This study demonstrates the validity of RE ions as dopants in gate dielectrics to achieve high-performance low-power metal oxide transistors.
Keywords
URL[Source Record]
Language
English
SUSTech Authorship
Others
Funding Project
Basic and Applied Basic Research Foundation of Guangdong Province[2021A1515110719];
ESI Research Field
MATERIALS SCIENCE
Scopus EID
2-s2.0-85152246990
Data Source
Scopus
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/524490
DepartmentDepartment of Chemistry
Affiliation
1.School of Physics and Optoelectric Engineering,Guangdong University of Technology,Guangzhou,Guangdong,510006,China
2.Department of Chemistry,Southern University of Science and Technology,Shenzhen,Guangdong,518060,China
3.James Watt School of Engineering,University of Glasgow,Glasgow,G12 8QQ,United Kingdom
First Author AffilicationDepartment of Chemistry
Recommended Citation
GB/T 7714
Zhao,Xin Hua,Zhuang,Jiaqing,Sun,Qi Jun,et al. Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors[J]. Journal of Alloys and Compounds,2023,952.
APA
Zhao,Xin Hua,Zhuang,Jiaqing,Sun,Qi Jun,Tang,Zhenhua,Tang,Xin Gui,&Roy,Vellaisamy A.L..(2023).Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors.Journal of Alloys and Compounds,952.
MLA
Zhao,Xin Hua,et al."Solution processed rare-earth doped high-k dielectrics for low-power IGZO transistors".Journal of Alloys and Compounds 952(2023).
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