中文版 | English
Title

一种AlGaN/GaN欧姆接触电极及其制备方法和用途

Alternative Title
AlGaN/GaN ohmic contact electrode and preparation method and application thereof
Author
First Inventor
于洪宇
Original applicant
南方科技大学
First applicant
南方科技大学
Address of First applicant
518000 广东省深圳市南山区西丽学苑大道1088号
Current applicant
南方科技大学
Address of Current applicant
518000 广东省深圳市南山区西丽学苑大道1088号 (广东,深圳,南山区)
First Current Applicant
南方科技大学
Address of First Current Applicant
518000 广东省深圳市南山区西丽学苑大道1088号 (广东,深圳,南山区)
Application Number
CN201911100606.1
Application Date
2019-11-12
Open (Notice) Number
CN110797397A
Date Available
2020-02-14
Status of Patent
驳回
Legal Date
2022-10-18
Subtype
发明申请
SUSTech Authorship
First
Abstract
本发明涉及一种AlGaN/GaN欧姆接触电极及其制备方法和用途,所述电极由下而上依次包括AlGaN/GaN基底、帽层金属层和TixAly合金层,其中,x>0,y>0。所述方法采用光刻技术在AlGaN层上定义漏极和/或源极图形,然后在AlGaN表面依次沉积TixAly合金和帽层金属层,去除光刻胶,进行剥离处理,再对剥离后的样品进行热处理,得到所述的AlGaN/GaN欧姆接触电极。本发明同时还提供一种降低AlGaN/GaN基底与电极之间欧姆接触的方法,通过AlGaN/GaN基底表面沉积TixAly合金层作为电极而实现。本发明提供的欧姆接触电极,达到射频器件的制备标准,同时提高器件的稳定性和可靠性。
Other Abstract
The invention relates to an AlGaN/GaN ohmic contact electrode and a preparation method and application thereof. The AlGaN/GaN ohmic contact electrode sequentially comprises an AlGaN/GaN substrate, a cap-layer metal layer and a TixAly alloy layer from bottom to top, wherein x is greater than 0, and y is greater than 0. The preparation method comprises the following steps: defining drain and/or source patterns on an AlGaN layer by using a photoetching technology; sequentially depositing the TixAly alloy and the cap-layer metal layer on the surface of the AlGaN layer; removing a photoresist; performing stripping treatment; and performing heat treatment on a stripped sample to obtain the AlGaN/GaN ohmic contact electrode. The invention further provides a method for reducing ohmic contact between the AlGaN/GaN substrate and an electrode. The method is realized by depositing the TixAly alloy layer on the surface of the AlGaN/GaN substrate for functioning as the electrode. The ohmic contact electrode provided by the invention reaches the preparation standard of a radio frequency device; and meanwhile, the stability and the reliability of the device are improved.
CPC Classification Number
H01L29/40 ; H01L29/401 ; H01L29/45 ; H01L29/452 ; H01L29/778
IPC Classification Number
H01L29/40 ; H01L29/45 ; H01L29/778
INPADOC Legal Status
(-REJECTION OF INVENTION PATENT APPLICATION AFTER PUBLICATION)[2022-10-18][CN]
INPADOC Patent Family Count
2
Extended Patent Family Count
2
Priority date
2019-11-12
Patent Agent
巩克栋
Agency
北京品源专利代理有限公司
URL[Source Record]
Data Source
PatSnap
Document TypePatent
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/531621
DepartmentSUSTech Institute of Microelectronics
Recommended Citation
GB/T 7714
于洪宇,蒋玉龙,范梦雅. 一种AlGaN/GaN欧姆接触电极及其制备方法和用途.
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