Title | 一种碳化硅位错检测方法 |
Alternative Title | Silicon carbide dislocation detection method
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Author | |
First Inventor | 邓辉
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Original applicant | 南方科技大学
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First applicant | 南方科技大学
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Address of First applicant | 518055 广东省深圳市南山区西丽学苑大道1088号
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Current applicant | 南方科技大学
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Address of Current applicant | 518055 广东省深圳市南山区西丽学苑大道1088号 (广东,深圳,南山区)
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First Current Applicant | 南方科技大学
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Address of First Current Applicant | 518055 广东省深圳市南山区西丽学苑大道1088号 (广东,深圳,南山区)
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Application Number | CN201811120149.8
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Application Date | 2018-09-25
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Open (Notice) Number | CN109270065A
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Date Available | 2019-01-25
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Status of Patent | 驳回
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Legal Date | 2022-02-25
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Subtype | 发明申请
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SUSTech Authorship | First
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Abstract | 本发明涉及单晶材料位错检测技术领域,公开了碳化硅位错检测方法。本发明提供一种碳化硅位错检测方法,包括如下步骤:S1,设置晶圆;S2,使用带有刻蚀气体的等离子体火炬扫描晶圆表面,对晶圆表面进行刻蚀;S3,对晶圆进行冷却处理;S4,观察晶圆表面刻蚀坑的数目,从而计算得到晶圆的位错密度。本发明的碳化硅位错检测方法,可以方便、快速地得到碳化硅表面刻蚀坑的数目信息,耗时短、危害性小、便于流水线工作。 |
Other Abstract | The invention relates to the technical field of dislocation detection of single-crystal materials and discloses a silicon carbide dislocation detection method. The silicon carbide dislocation detection method provided by the invention comprises the following steps: S1, setting a wafer; S2, scanning the surface of the wafer by utilizing a plasma torch with etching gas and etching the surface of thewafer; S3, carrying out cooling treatment on the wafer; S4, observing the quantity of etching pits on the surface of the wafer, so as to calculate the dislocation density of the wafer. The silicon carbide dislocation detection method provided by the invention can be used for conveniently and rapidly obtaining the quantity information of the etching pits on the surface of silicon carbide and has the advantages of short consumed time, small dangers and convenience for assembly line work. |
CPC Classification Number | H01L22/12
; G01N1/28
; G01N1/34
; G01N21/84
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IPC Classification Number | G01N21/84
; G01N1/28
; G01N1/34
; H01L21/66
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INPADOC Legal Status | (-REJECTION OF INVENTION PATENT APPLICATION AFTER PUBLICATION)[2022-02-25][CN]
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INPADOC Patent Family Count | 1
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Extended Patent Family Count | 1
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Priority date | 2018-09-25
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Patent Agent | 唐致明
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Agency | 广州嘉权专利商标事务所有限公司
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URL | [Source Record] |
Data Source | PatSnap
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Document Type | Patent |
Identifier | http://kc.sustech.edu.cn/handle/2SGJ60CL/531675 |
Department | Department of Mechanical and Energy Engineering |
Recommended Citation GB/T 7714 |
邓辉,张翊. 一种碳化硅位错检测方法.
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