| Title | Highly Sensitive Metamaterial Plasmonic Sensor Based on Nanoimprinting |
| Author | |
| DOI | |
| Publication Years | 2023
|
| ISSN | 2166-8884
|
| ISBN | 978-1-6654-6214-3
|
| Source Title | |
| Pages | 1-3
|
| Conference Date | 2-6 July 2023
|
| Conference Place | Shanghai, China
|
| Keywords | |
| SUSTech Authorship | Others
|
| URL | [Source Record] |
| Data Source | IEEE
|
| PDF url | https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10209820 |
| Citation statistics |
Cited Times [WOS]:0
|
| Document Type | Conference paper |
| Identifier | http://kc.sustech.edu.cn/handle/2SGJ60CL/559179 |
| Department | Department of Materials Science and Engineering |
| Affiliation | 1.State Key Laboratory of Radio Frequency Heterogeneous Integration, (Shenzhen University) Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, China 2.Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen, China |
| Recommended Citation GB/T 7714 |
Enlai Zheng,Xuanming Zhang,Fei Lou,et al. Highly Sensitive Metamaterial Plasmonic Sensor Based on Nanoimprinting[C],2023:1-3.
|
| Files in This Item: | There are no files associated with this item. | |||||
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