中文版 | English
Title

Materials removal mechanism of single crystalline SiC with laser-induced periodic surface structures (LIPSS)

Author
Corresponding AuthorPan,Rui
Publication Years
2023-12-01
DOI
Source Title
ISSN
0924-0136
EISSN
1873-4774
Volume321
Abstract
The surface modification by ultra-fast laser could regulate the mechanical properties of hard and brittle materials. Since silicon carbide (SiC) is too hard to be machined with acceptable removal rate and quality by mechanical abrasives, and femtosecond laser (fs-laser) assisted grinding could be a potential method to improve the machinability of SiC. Under fs-laser modulating, SiC surface could be modified to generate laser-induced periodic surface structures (LIPSS). Understanding the mechanical properties and material removal mechanism of the LIPPS surface is crucial to accomplish a high efficiency and quality machining process. This paper aims to investigate the effects of fs-laser modification on the mechanical properties, removal mechanism, removal efficiency, and microstructure changes of 4H-SiC surface during removal, together with those of the original 4H-SiC surface for comparison. The hardness and elastic recovery ability of the modified layer are determined by nano-indentation test, and the nano-scratch test is adopted to study the materials removal behavior. The removal efficiency and the quality of the modified surface is significantly improved. Phase transformation is observed in the scratching area, which reveals the existence of ductile mode removal. Moreover, the stress distribution and the change of scratching force on the surface of SiC before and after modification are studied by finite element method (FEM). The results show that the stress distribution and transmission when scratched on the modified surface is lower than that of the original surface, and the scratching force under the same scratch conditions is greatly reduced. With the understanding of materials removal behavior from the whole process of deformation, phase transformation, and separation of LIPPS from substrate, then the fs-laser modification of SiC could be evidenced as an effective method to improve the grinding efficiency and quality in mass production of industry.
Keywords
URL[Source Record]
Indexed By
Language
English
SUSTech Authorship
Others
Funding Project
Natural Science Foundation of Beijing Municipality[3222005];
WOS Research Area
Engineering ; Materials Science
WOS Subject
Engineering, Industrial ; Engineering, Manufacturing ; Materials Science, Multidisciplinary
WOS Accession No
WOS:001076566600001
Publisher
ESI Research Field
MATERIALS SCIENCE
Scopus EID
2-s2.0-85169051047
Data Source
Scopus
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/559423
DepartmentDepartment of Mechanical and Energy Engineering
Affiliation
1.Institute of Electronics Packaging Technology & Reliability,Faculty of Materials and Manufacturing,Beijing University of Technology,Beijing,100124,China
2.Beijing Key Laboratory of Advanced Manufacturing Technology,Faculty of Materials and Manufacturing,Beijing University of Technology,Beijing,100124,China
3.Institute of Intelligent Forming Equipment and System,Faculty of Materials and Manufacturing,Beijing University of Technology,Beijing,100124,China
4.Department of Mechanical and Energy Engineering,Southern University of Science and Technology,Shenzhen,518055,China
Recommended Citation
GB/T 7714
Chen,Pei,Chi,Zhuangzhuang,Pan,Rui,et al. Materials removal mechanism of single crystalline SiC with laser-induced periodic surface structures (LIPSS)[J]. Journal of Materials Processing Technology,2023,321.
APA
Chen,Pei.,Chi,Zhuangzhuang.,Pan,Rui.,Qin,Fei.,Qiu,Pei.,...&Xu,Shaolin.(2023).Materials removal mechanism of single crystalline SiC with laser-induced periodic surface structures (LIPSS).Journal of Materials Processing Technology,321.
MLA
Chen,Pei,et al."Materials removal mechanism of single crystalline SiC with laser-induced periodic surface structures (LIPSS)".Journal of Materials Processing Technology 321(2023).
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