中文版 | English
Title

Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction

Author
Corresponding AuthorYu, Hongyu; Chai, Yang
Publication Years
2023-09-01
DOI
Source Title
ISSN
1616-301X
EISSN
1616-3028
Abstract
Resistive random access memory (RRAM) crossbar arrays require the highly nonlinear selector with high current density to address a specific memory cell and suppress leakage current through the unselected cell. 3D monolithic integration of RRAM array requires selector devices with a small footprint and low-temperature processing for ultrahigh-density data storage. Here, an ultrathin two-terminal n-p-n selector with 2D transition metal dichalcogenides (TMDs) is designed by a low-temperature transfer method. The van der Waals contact between transferred Au electrodes and TMDs reduces the Fermi level pinning and retains the intrinsic transport behavior of TMDs. The selector with a single type of TMD exhibits a trade-off between current density and nonlinearity depending on the barrier height. By tuning the Schottky barrier height and controlling the thickness of p-type WSe2 in MoS2/WSe2/MoS2 n-p-n selector for a punch-through transport, the selector shows high nonlinearity (approximate to 230) and high current density (2 x 10(3) A cm(-2)) simultaneously. The n-p-n selectors are further integrated with a bipolar hexagonal boron nitride memory and calculate the maximum crossbar size of the 2D material-based one-selector one-resistor according to a 10% read margin, which offers the possible realization of future 3D monolithic integration.
Keywords
URL[Source Record]
Indexed By
Language
English
Important Publications
NI Journal Papers
SUSTech Authorship
Corresponding
Funding Project
Research Grant Council of Hong Kong[CRS_PolyU502/22] ; Shenzhen Science and Technology Innovation Commission[SGDX2020110309540000] ; Innovation Technology Fund[ITS/047/20] ; Hong Kong Polytechnic University[1-ZE1T] ; Hong Kong Polytechnic University Shenzhen Research Institute[I2022A013]
WOS Research Area
Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS Subject
Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS Accession No
WOS:001067836900001
Publisher
ESI Research Field
MATERIALS SCIENCE
Data Source
Web of Science
Citation statistics
Cited Times [WOS]:0
Document TypeJournal Article
Identifierhttp://kc.sustech.edu.cn/handle/2SGJ60CL/575858
DepartmentSUSTech Institute of Microelectronics
Affiliation
1.Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong 999077, Peoples R China
2.Southern Univ Sci & Technol, Sch Microelect, Shenzhen 518055, Peoples R China
First Author AffilicationSUSTech Institute of Microelectronics
Corresponding Author AffilicationSUSTech Institute of Microelectronics
First Author's First AffilicationSUSTech Institute of Microelectronics
Recommended Citation
GB/T 7714
Chen, Hongye,Wan, Tianqing,Zhou, Yue,et al. Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction[J]. ADVANCED FUNCTIONAL MATERIALS,2023.
APA
Chen, Hongye.,Wan, Tianqing.,Zhou, Yue.,Yan, Jianmin.,Chen, Changsheng.,...&Chai, Yang.(2023).Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction.ADVANCED FUNCTIONAL MATERIALS.
MLA
Chen, Hongye,et al."Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction".ADVANCED FUNCTIONAL MATERIALS (2023).
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