Title | Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction |
Author | |
Corresponding Author | Yu, Hongyu; Chai, Yang |
Publication Years | 2023-09-01
|
DOI | |
Source Title | |
ISSN | 1616-301X
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EISSN | 1616-3028
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Abstract | Resistive random access memory (RRAM) crossbar arrays require the highly nonlinear selector with high current density to address a specific memory cell and suppress leakage current through the unselected cell. 3D monolithic integration of RRAM array requires selector devices with a small footprint and low-temperature processing for ultrahigh-density data storage. Here, an ultrathin two-terminal n-p-n selector with 2D transition metal dichalcogenides (TMDs) is designed by a low-temperature transfer method. The van der Waals contact between transferred Au electrodes and TMDs reduces the Fermi level pinning and retains the intrinsic transport behavior of TMDs. The selector with a single type of TMD exhibits a trade-off between current density and nonlinearity depending on the barrier height. By tuning the Schottky barrier height and controlling the thickness of p-type WSe2 in MoS2/WSe2/MoS2 n-p-n selector for a punch-through transport, the selector shows high nonlinearity (approximate to 230) and high current density (2 x 10(3) A cm(-2)) simultaneously. The n-p-n selectors are further integrated with a bipolar hexagonal boron nitride memory and calculate the maximum crossbar size of the 2D material-based one-selector one-resistor according to a 10% read margin, which offers the possible realization of future 3D monolithic integration. |
Keywords | |
URL | [Source Record] |
Indexed By | |
Language | English
|
Important Publications | NI Journal Papers
|
SUSTech Authorship | Corresponding
|
Funding Project | Research Grant Council of Hong Kong[CRS_PolyU502/22]
; Shenzhen Science and Technology Innovation Commission[SGDX2020110309540000]
; Innovation Technology Fund[ITS/047/20]
; Hong Kong Polytechnic University[1-ZE1T]
; Hong Kong Polytechnic University Shenzhen Research Institute[I2022A013]
|
WOS Research Area | Chemistry
; Science & Technology - Other Topics
; Materials Science
; Physics
|
WOS Subject | Chemistry, Multidisciplinary
; Chemistry, Physical
; Nanoscience & Nanotechnology
; Materials Science, Multidisciplinary
; Physics, Applied
; Physics, Condensed Matter
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WOS Accession No | WOS:001067836900001
|
Publisher | |
ESI Research Field | MATERIALS SCIENCE
|
Data Source | Web of Science
|
Citation statistics |
Cited Times [WOS]:0
|
Document Type | Journal Article |
Identifier | http://kc.sustech.edu.cn/handle/2SGJ60CL/575858 |
Department | SUSTech Institute of Microelectronics |
Affiliation | 1.Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong 999077, Peoples R China 2.Southern Univ Sci & Technol, Sch Microelect, Shenzhen 518055, Peoples R China |
First Author Affilication | SUSTech Institute of Microelectronics |
Corresponding Author Affilication | SUSTech Institute of Microelectronics |
First Author's First Affilication | SUSTech Institute of Microelectronics |
Recommended Citation GB/T 7714 |
Chen, Hongye,Wan, Tianqing,Zhou, Yue,et al. Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction[J]. ADVANCED FUNCTIONAL MATERIALS,2023.
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APA |
Chen, Hongye.,Wan, Tianqing.,Zhou, Yue.,Yan, Jianmin.,Chen, Changsheng.,...&Chai, Yang.(2023).Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction.ADVANCED FUNCTIONAL MATERIALS.
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MLA |
Chen, Hongye,et al."Highly Nonlinear Memory Selectors with Ultrathin MoS2/WSe2/MoS2 Heterojunction".ADVANCED FUNCTIONAL MATERIALS (2023).
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